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The Effects of Post-Thermal Annealing on the Emission Spectra of GaAs/AlGaAs Quantum Dots grown by Droplet Epitaxy

机译:后热退火对碳纳米管发射光谱的影响   由Droplet Epitaxy生长的Gaas / alGaas量子点

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摘要

We fabricated GaAs/AlGaAs quantum dots by droplet epitaxy method, andobtained the geometries of the dots from scanning transmission electronmicroscopy data. Post-thermal annealing is essential for the optical activationof quantum dots grown by droplet epitaxy. We investigated the emission energyshifts of the dots and underlying superlattice by post-thermal annealing withphotoluminescence and cathodoluminescence measurements, and specified theemissions from the dots by selectively etching the structure down to a lowerlayer of quantum dots. We studied the influences of the degree of annealing onthe optical properties of the dots from the peak shifts of the superlattice,which has the same composition as the dots, since the superlattice has uniformand well-defined geometry. Theoretical analysis provided the diffusion lengthdependence of the peak shifts of the emission spectra.
机译:通过液滴外延法制备了GaAs / AlGaAs量子点,并通过扫描透射电镜数据获得了点的几何形状。后热退火对于通过液滴外延生长的量子点的光学激活至关重要。我们通过采用光致发光和阴极发光测量的后热退火研究了点和下方超晶格的发射能位移,并通过选择性地向下蚀刻量子点的下层结构来指定从点的发射。我们从超晶格的峰位移研究了退火程度对点的光学性能的影响,超晶格具有与点相同的组成,因为超晶格具有均匀且定义明确的几何形状。理论分析提供了发射光谱的峰位移的扩散长度依赖性。

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